Published Methods of Thin Film Formation Using Meliorum's Nanomaterials

9 Mar 2015

 

Meliorum scientists and engineers have spoken with several different customers to obtain information on various techniques that are used to deposit our nanomaterials for the purpose of making nanoparticle thin films.  We have selected four different academic articles from our list of customers, each describing a different method for making thin films. 

 

The first article employs a laser heating method.  A laser is used to “sinter” the particles, which leverages a unique property of nanoparticles to generally have a lower melting temperature than its associated solid.  The details of the process – which specifically uses our silicon nanoparticles – are described in the article [1].

 

The second article discusses an ink jet sintering method.  This is the method that is used most often currently, and various industrial style ink jet printers can be used to deposit and heat on a given substrate, for sintering of the particles to take place.  Once again, our silicon nanoparticles are featured in the article [2].

 

The third article discusses the use of a Langmuir Blodgett method for deposition of our silicon nanoparticles on a given substrate.  These particular particles, again manufactured by us, have been previously stabilized by us using sodium dodecylbenzenesulfonate for this work, however, a brief horn or probe ultrasonication would also work to ensure the distribution of particles is even and homogeneous [3].

 

Lastly, the fourth article discusses the use of our particles in a PVDF (poly(vinylidene fluoride), molecular weight=534,000) matrix, dispersed in 1-methyl-2-pyrrolidone.  Described in detail in the “Experimental Section,” the particles are mixed with the PVDF, and the PVDF is used as a matrix for drop-casting with a subsequent 90°C oven cure [4].

 

Meliorum is proud to be in a position to support such critical applied research.  As many products see improvements in their feature offerings and performance as a result of their incorporation with nanomaterials, it becomes ever more critical to fully characterize the manner and process in which these materials can be modified into different form factors.  

 

The article abstracts may be accessed by clicking the respective footnote references above.  The same silicon nanomaterials that were used in the experimentation are featured in Meliorum's silicon nanoparticles page.

 

Please note that any or all of the mentioned thin film formation techniques may be patent protected.  Please contact the authors of the relevant research for additional information.

 

[1] Materials Science and Engineering: B

Volume 130, Issues 1–3, 15 June 2006, Pages 228–236

 

Thin film deposition on plastic substrates using silicon nanoparticles and laser nanoforming

 

Sachin Bet and Aravinda Kar

 

[2] Physica status solidi (a)

Volume 211, Issue 6, pages 1301–1307, June 2014

 

Characterization of sintered inkjet-printed silicon nanoparticle thin films for thermoelectric devices

 

Etienne Drahi, Anshul Gupta, Sylvain Blayac, Sébastien Saunier and Patrick Benaben

 

[3] Physics Procedia

Volume 32, 2012, Pages 285–288

 

Pentacene-gate dielectric interface modification with silicon nanoparticles for OTFTs (Organic Thin Film Transistors)

 

J. Jakabovica, J. Kovaca, R. Srnaneka, M. Weisb, M. Sokolskyc, K. Brochd, F. Schreiberd, D. Donovala, J. Cirak

 

[4] Advanced Materials

Volume 23, Issue 47, pages 5613–5617, December 15, 2011

 

Nanoscale In Situ Characterization of Li-ion Battery Electrochemisry Via Scanning Ion Conductance Microscopy

 

Albert L. Lipson , Ryan S. Ginder , and Mark C. Hersam 

 

 

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